Dedicated 2D Materials Deposition Laboratory

MOCVD

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Metal-Organic Chemical Vapor deposition chamber, fully encapsulated in glove-box. Can hold up to 6inch wafer, various solid, liquid and gaseous precursor sources, temperatures up to 1000°C

Type: Metal-Organic Chemical Vapor deposition (MOCVD) device. Reactor (actual device) made by ATV, Glovebox (encapsulation) provided by GS-Glovebox

 

ATV ALD

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ATV-ALD (Atomic Layer Deposition) chamber for deposition of high-quality oxides, can hold up to 5inch wafers. 

Type: Atomic layer deposition chamber

Manufacturer: ATV

 

CVD Tube Furnaces

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Chemical Vapor Deposition custom build tube furnaces, used for deposition of Graphene,  MoS2 and other TMD materials.